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Akihiko Ohtsu

Former Project
Adaptive Metamaterials

Short CV
Akihiko Ohtsu completed his master's degree in materials science from Tohoku University, Japan. In 2009, he joined for Fujifilm Corporation, where he has been engaged in the research of nanoimprint lithography and plasma processing. Since 2013, in addition to these researches, Mr. Ohtsu has been involved in the research of nanophotonic device and optical cloaking.

Joint Articles

  1. Templated assembly of metal nanoparticle films on polymer substrates
    R. F. Waters, A. Ohtsu, M. Naya, P. A. Hobson, K. F. MacDonald, and N. I. Zheludev
    Appl. Phys. Lett. 109, 263105 (2016) doi: 10.1063/1.4973202 - pdf